CFD Review  
Serving the CFD Community with News, Articles, and Discussion
 
CFD Review

User Preferences
Site Sponsorship
Headline Feeds
Mobile Edition
Privacy Policy
Terms of Service
twitter

Submit a CFD Story

Site Sponsors
The Choice for CFD Meshing
Azore CFD
CFD Review

Tell a Friend
Help this site to grow by sending a friend an invitation to visit this site.

CFD News by Email
Did you know that you can get today's CFD Review headlines mailed to your inbox? Just log in and select Email Headlines Each Night on your User Preferences page.

 
Application: CFD Analysis of a Commercial Plasma Reactor
Posted Fri June 22, 2001 @09:29AM
Print version Email story Tweet story
Application CFD Canda and CFDRC, in conjunction with KyungWon Tech of Korea, have simulated [pdf file] two commercial high-density plasma reactors of the type used in integrated circuit wafer production. The study concentrated on flow and temperature distribution in the chemical vapor deposition (CVD) process.
In recent years considerable amount of research was devoted to plasma and electromagnetic modeling of process chambers, however thermal aspects were often omitted by assuming constant chamber temperatures. Variation in temperature distribution leads to variation in precursor and intermediate concentrations, which in turn changes surface adsorbtion and surface reaction rates.

Sponsor CFD Review

[ Post Comment ]

Airpak 2.0 Released | IBM Delivers World's 2nd Fastest Computer  >

 

 
CFD Review Login
User name:

Password:

Create an Account

Related Links
  • CFD Canda
  • CFDRC
  • [pdf file]
  • More on Application
  • Also by nwyman
  • This discussion has been archived. No new comments can be posted.

    You will be the victim of a bizarre joke. All content except comments
    ©2022, Viable Computing.

    [ home | submit story | search | polls | faq | preferences | privacy | terms of service | rss  ]