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CFD Leads to Better Filter Design
Posted Wed August 11, 2004 @11:47AM
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Application Extraction, a leader in semiconductor contamination measurement, has introduced a new filter system which puts proven technology in a significantly smaller footprint, enabling users to lower cost of ownership in deep UV (DUV) lithography.
"By using sophisticated computational fluid dynamics flow modeling techniques, we've succeeded in putting all the power and long-life filter protection of the E3000 in a much smaller footprint," David Ruede, Filtration Group Manager. "A smaller footprint quickly translates to significant savings in cost of ownership and gives users more installation flexibility. These are important advantages as new fabs ramp production and older fabs install new generations of lithography tools."

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