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| Hilson Moran Signs Deal with Fluent |
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| CAD-based CFD Attracts Design Engineers |
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Posted Mon August 16, 2004 @02:43PM
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A feature article at Desktop Engineering highlights the changes that CAD-based CFD has had on the adoption of CFD by design engineers.
"CAE has been an elite subject, with complex tools that were easy to forget dedicated to their use," says Dr. Ashok Das, manager of the Center for Modeling and Simulation at Applied Materials, Santa Clara, CA, manufacturers of semiconductor wafer processing equipment. "Nowadays, not many companies can afford many dedicated analysts. My vision is to bring CFD and FEA tools to the desk of design and process engineers."
Owen Warr, project engineer with Zero Zone, Inc., North Prairie, WI, makers of display coolers, freezers, and refrigerated merchandising cases, has had more than 15 years of experience using a variety of CAE tools. "When it comes to CFD, I remember when I had to write my own programs in Fortran, get geometry from 2D AutoCAD, then merge the program and geometry into Abaqus to run CFD. The dramatic changes in CFD since then are almost surreal," he says.
Read the full article (free registration required) over at Desktop Engineering.
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| Events: Advanced CFD Technologies Seminar
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Posted Fri August 13, 2004 @04:37PM
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Join ANSYS for one of a new series of one-day educational seminars in the US Southeast entitled Advanced CFD Technologies Featuring ANSYS ICEM CFD and CFX. At this free seminar, you’ll learn how you can tackle CFD challenges—from pre-processing to solution to post-processing—quickly, accurately and cost-effectively.
Using a combination of real-world customer examples and live demonstrations, our experts will discuss how ICEM CFD and CFX can shorten product design times and improve product development processes. In the morning session, you’ll learn how ICEM CFD improves grid generation and the afternoon session will inform you how the advanced solver technology in CFX provides quick and accurate results for complex, real-world problems.
September 14, 2004
Laurel, MD
More information
September 15, 2004
Huntsville, AL
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October 6, 2004
Orlando, FL
More Information
The seminar is designed for engineers, product designers and managers who play a role in product development and verification.
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Posted Wed August 11, 2004 @11:47AM
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Extraction, a leader in semiconductor contamination measurement, has introduced a new filter system which puts proven technology in a significantly smaller footprint, enabling users to lower cost of ownership in deep UV (DUV) lithography.
"By using sophisticated computational fluid dynamics flow modeling techniques, we've succeeded in putting all the power and long-life filter protection of the E3000 in a much smaller footprint," David Ruede, Filtration Group Manager. "A smaller footprint quickly translates to significant savings in cost of ownership and gives users more installation flexibility. These are important advantages as new fabs ramp production and older fabs install new generations of lithography tools."
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